Conference Program

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	Thursday, December 5	Friday, December 6
8:00	Registration	Registration
8:30	Welcome	Registration
8:40	Invited Talk Fabrication of chromium carbide coatings by reactive sputtering – roles of power supply system and target poisoning Jyh-Wei Lee Ming Chi University of Technology, New Taipei, Taiwan	Invited talk Coating development by reactive sputtering for energy related applications Lucia Mendizabal IK4Tekniker, Spain
9:20	The growth of multicomponent (CoCrFeMnNi) films by DC magnetron sputtering in Ar+dry air sputtering gas György Radnóczi Centre for Energy Research, Hungary	Deposition of micrometer-scale 3D pillar structures at room temperature without techniques such as glancing angle deposition, lithography, or shadow masking Jarkko Etula Aalto University, Finland
9:40	Influence of nitrogen content on structure and material properties for multi-component Al-Cr-Nb-Y-Zr-N thin films Kristina von Fieandt Uppsala University, Sweden	Multicomponent mobility at the interface between glass and oxides thin layers Sirine Ben Khemis Saint Gobain Recherche, France
10:00	Poster Session I and Coffee break	Poster Session IV and Coffee break
10:40	Reactive ion beam sputter deposition of SiO₂ and TiO₂ thin films Carsten Bundesmann Leibniz Institute of Surface Engineering (IOM), Germany	Temporal evolution of sputtered species number densities in reactive HiPIMS with nitrogen admixture Katarína Bernátová Masaryk University, Czech Republic
11:00	Electronegativity of Mg-CF₄ reactive sputter discharge Eiji Kusano Kanazawa Institute of Technology, Japan	How can we get a porous film by magnetron sputtering Robin Dedoncker Ghent University, Belgium
11:20	Analysis of hysteresis during the reactive magnetron sputtering process of piezoelectric zinc oxide thin films Mhairi Rogan NOVOSOUND LTD., United Kingdom	Spoke behaviour in reactive HiPIMS Peter Klein Masaryk University, Czech Republic
11:40	Diamond like carbon films with embedded copper nanoparticles deposited by reactive magnetron sputtering for saturable absorber mirror applications Šarunas Meškinis Kaunas University of Technology, Lithuania	On the description of metal ion return in reactive HiPIMS Tomas Kubart Uppsala University, Sweden
12:00	Lunch	Lunch
13:20	Invited talk Reactive magnetron sputtering, challenges in industrial and large area coating systems Holger Pröhl VON ARDENNE GmbH, Germany	Invited talk Atomistic simulations of reactive deposition processes Marco Jupé Laser Zentrum Hannover, Germany
14:00	Novel control technique for reactive HIPIMS processes to secure production stability over a target lifetime Thomas Schütte PLASUS GmbH, Germany	Distribution of O atoms on partially oxidized metal targets, and the consequences for sputtering of individual metal oxides Jiri Houska University of West Bohemia, Czech Republic
14:20	Challenges and solutions of reactive sputter deposition processes in the production environment: stability and control Edmund Schüngel Evatec AG, Switzerland	Unravel the nature of oxide sputter yields during reactive DC magnetron deposition Koen Strijckmans Ghent University, Belgium
14:40	12 µm in PVD with HiPIMS Christoph Schiffers CemeCon AG, Germany	Polycrystalline coatings: a fast method to model grain joints and thin-film interfaces Jérôme Müller Université de Namur, Belgium
15:00	Poster session II and Coffee break	Simulation assisted deposition of optical filters onto 3D substrates by magnetron-sputtering Andreas Pflug Fraunhofer Institute for Surface Engineering and Thin Films IST, Germany
15:20	Poster session II and Coffee break	Closing Ceremony with Poster Prize
15:40	Reactive sputter deposited CuWo₄/WO₃ nanostructured bilayers for hydrogen gas sensing Nirmal Kumar University of West Bohemia, Czech Republic	Closing Ceremony with Poster Prize
16:00	Photocatalytic bismuth oxide coatings and their potential for water treatment applications Peter Kelly Manchester Metropolitan University, United Kingdom
16:20	Low-temperature deposition of high-performance thermochromic VO₂-based coatings for energy-saving windows Tomáš Bárta University of West Bohemia, Czech Republic
16:40	Reactive magnetron deposited SnZnO_x coatings with low resistivity and high transparency Martin Kormunda J.E. Purkyne University, Czech Republic
17:00	Poster session III, Coffee break, and Company Tour
18:00	End of the first conference day
19:30	Conference Dinner Altstadtrathaus-Dornse, Altstadtmarkt 7, 38100 Braunschweig

Invited Speaker

Coating scientists, technologists, and managers will be invited to present papers at the conference:

Prof. Jyh-Wei Lee, Ming Chi University of Technology, New Taipei, Taiwan

”Fabrication of chromium carbide coatings by reactive sputtering- roles of power supply system and target poisoning” (Abstract)

Dr. Marco Jupé, Laser Zentrum Hannover, Germany

”Atomistic simulations of reactive deposition processes ” (Abstract)

Dr. Lucia Mendizabal, IK4Tekniker, Spain

”Coating development by reactive sputtering for energy related applications” (Abstract)

Dr. Holger Pröhl, VON ARDENNE GmbH, Germany

”Reactive magnetron sputtering, challenges in industrial and large area coating systems” (Abstract)

Poster Presentation

Influence of hydrogen on arc deposited chromium coatings
Johan Nyman
Linköping University, Sweden

Thermal stability of fracture-resistant W-B-C coatings
Saeed Mirzaei
Masaryk University, Czechia

On the structure and mechanical properties W-B-C coatings prepared by magnetron sputtering utilizing pulsed plasma excitation
Pavel Soucek
Masaryk University, Czech Republic

Amorphous zinc peroxide thin films deposited on actively cooled substrates by magnetron sputtering
Martins Zubkins
Institute of Solid State Physics, Latvia

DC magnetron sputtering: understanding the inherent limitations of 3D Pic-MC simulations and solutions to unravel them towards lab-scaled discharge current densities
Romain Tonneau
University of Namur, Belgium

Synthesis of nanoparticles by magnetron sputtering of silver onto castor oil
Anastasiya Sergievskaya
Umons, Belgium

Reactive sputter deposited Al/CuO thermite multilayers
Dulmaa Altangerel
Ghent University, Belgium

Deposition of TiO₂ by means of HiPIMS: the dependence of optical properties on the energy deposited per atom
Pavel Moskovkin
University of Namur, Belgium

Continuous cleaning procedure of stainless steel by PVD sputtering in an inverted cylindrical magnetron
Carolina Esparza-Contro
Univ. Grenoble Alpes, France

Textured analysis of Ain films deposided on different substrates by DC reactive magnetron sputtering
RIAH Badis
University of Constantine 1, Algeria

Stabilizing reactive sputtering processes with moving substrates by plasma monitor feedback control
Tobias Radny
robeko GmbH & Co. KG, Germany

In-plane texturing of silver thin films
Francesca Corbella
Saint Gobain Research, France

Using remote plasma emission spectroscopy for control of various types of vacuum deposition processes
Florian Meyer
Gencoa Limited, UK

Boron sputtering with Ar and boron reactive sputtering with Ar and N₂
Y.S. Song
Korea Institut of Industrial Technology, Republic of Korea

The effect of Cr content on the crystallographic and piezoelectric properties of Cr_xAl_1-xN thin films
Saeedeh Soleimani
Hungarian Academy of Science-Institute of technical physics (MTA EK), Hungary

Joint experimental and theoretical study of the reactive magnetron PECVD of DLC films in an acetylene admixture
Antoine Fauroux
University of Namur, Belgium

Short Course

”Reactive Magnetron Sputter Deposition”

Reactive magnetron sputter deposition is a mature technique often used in laboratories and at industrial level to grow compound thin films. The growth of these films is defined by the deposition conditions, and therefore a good knowledge of the deposition process is essential to tune the growth and as such the film properties. After a short introduction on the physics of sputtering, the magnetron discharge and the transport of sputtered atoms through the gas phase, the course starts with a few definitions regarding reactive sputtering to show that the processes driving this technique are general applicable. This introduction assists the attendee to the next step: the description of the most common experiment during reactive magnetron sputtering, the hysteresis experiment. The simplicity of this experiment fools initially the scientist because it hides a complex interplay between different processes that define the actual outcome of the experiment. During the course, the details of this experiment are analyzed, and modelling is used to guide the attendee. In this way, the attendee will gain knowledge in a wealth of important process controlling the film growth. A good knowledge of these processes will arm the attendee to analyze and to control the reactive sputtering process.

Course Objectives

Understand the fundamental processes driving (reactive) magnetron sputtering
Develop strategies for dedicated experiments to unravel the complexity of reactive magnetron sputtering
To get a good overview of the current literature and modelling techniques
Sputtering: physics of sputtering, and transport of sputtered atoms
Magnetron discharges : typical features, electron emission, excitation and ionization
Hysteresis experiments : what can we learn from this “simple” experiment?
Influence of deposition parameters
Dynamics of reactive sputter deposition
Arcing
Discharge voltage behavior
Process parameters and thin film growth
Questions and answers

Instructor

Diederik Depla, Professor, Ghent University, Ghent, Belgium