Atomic layer deposition is a modified process of chemical vapor deposition. The characteristics of the process are two successive self-limiting surface reactions, so that extremely thin, low-defect and extremely homogeneous layers can be deposited. A key advantage is the precise control of layer thickness and material composition for three-dimensional, complex geometric or structured substrates, resulting in highly conformal and uniform layers.
The Fraunhofer IST offers customers from industry and research application-specific and flexible solutions. Our services in the field of conformal coatings range from process development for thermal ALD coating systems to the development of customized functional coatings on complex geometric substrates as well as particle materials.
The Beneq TFS 500 is a coating system based on thermal atomic layer deposition for research and development and batch production for the production of homogeneous and uniform single layers as well as nanolaminate systems. The focus is on the deposition of metal oxides (e.g. Al2O3, TiO2, ZnO, SnO2, Nb2O5, SiO2) for application as optical functional layers, barrier layers, battery material functionalization, particle and textile coatings.
The FHR Star 400x300 SALD coating system is based on thermal local atomic layer deposition for high throughput coating for the deposition of homogeneous and uniform single layers as well as nanolaminate systems. The focus is on the deposition of metal oxides for application as optical functional layers, barrier layers, energy material functionalization and textile coatings. The flexible design allows the integration of different coating and activation options within a dedicated hybrid area as well as within the precursor zones.