Atomic Layer Deposition (ALD)

Local atomic layer deposition: View of the rotating turntable below the heating block in the hybrid area.
© Fraunhofer IST
Local atomic layer deposition: View of the rotating turntable below the heating block in the hybrid area.

Coating and process development for the deposition of conformal and uniform coating systems

Atomic layer deposition is a modified process of chemical vapor deposition. The characteristics of the process are two successive self-limiting surface reactions, so that extremely thin, low-defect and extremely homogeneous layers can be deposited. A key advantage is the precise control of layer thickness and material composition for three-dimensional, complex geometric or structured substrates, resulting in highly conformal and uniform layers.
 

Your partner for innovative coating solutions

The Fraunhofer IST offers customers from industry and research application-specific and flexible solutions. Our services in the field of conformal coatings range from process development for thermal ALD coating systems to the development of customized functional coatings on complex geometric substrates as well as particle materials.

Our focus and expertise

 

Reference project

Medical and pharmaceutical process engineering

 

Expertise

Optical systems

 

Expertise

Nanomaterials for the energy revolution

Selected reference projects

 

Reference project

TransPlaMed - Manufacturing platform for innovations in medical engineering

 

Reference project

Defect-free silicon oxide layers for the Avogadro project

Beneq TFS 500

The ALD process is capable of coating three-dimensional objects and complex geometries with high conformity and homogeneity.
© Fraunhofer IST, Jan Benz
The ALD process is capable of coating three-dimensional objects and complex geometries with high conformity and homogeneity.

The Beneq TFS 500 is a coating system based on thermal atomic layer deposition for research and development and batch production for the production of homogeneous and uniform single layers as well as nanolaminate systems. The focus is on the deposition of metal oxides (e.g. Al2O3, TiO2, ZnO, SnO2, Nb2O5, SiO2) for application as optical functional layers, barrier layers, battery material functionalization, particle and textile coatings.

 

Specifications / technical data

  • Thermal atomic layer deposition
  • Batch coater (cross flow & stop flow for 2D/3D, forced flow fluidized bed for particles)
  • 3D-lock and 2D-loadlock
  • Substrate materials: wafers, glass, plastics, metals, textiles, particles
  • Single wafer: ø200 ×10 mm
  • 3D-batch (multiwafer): ø210 × 170 mm
  • Particle coating: ø80 × 50 mm (~ 100 cm3), particle size > 10 µm

 

FHR Star 400x300 SALD

FHR Star 400x300 SALD coating system for thermal local atomic layer deposition.
© Fraunhofer IST
FHR Star 400x300 SALD coating system for thermal local atomic layer deposition.

The FHR Star 400x300 SALD coating system is based on thermal local atomic layer deposition for high throughput coating for the deposition of homogeneous and uniform single layers as well as nanolaminate systems. The focus is on the deposition of metal oxides for application as optical functional layers, barrier layers, energy material functionalization and textile coatings. The flexible design allows the integration of different coating and activation options within a dedicated hybrid area as well as within the precursor zones.

 

Specifications / technical data

  • Rotary table apparatus for thermal local atomic layer deposition
  • 100 rpm (Al2O3: 10 nm/min)
  • Substrate materials: wafers, glass, plastics, metals, textiles
  • 4x 2D substrates: ø 200 mm
  • 2x 3D substrates: 400 x 300 mm
  • Maximum substrate thickness: 10 mm
  • Hybrid zone for the integration of various coating and activation options
  • Modular and flexible apparatus design and process adaptation

 

© Fraunhofer IST
View of the rotating turntable and heating block.
© Fraunhofer IST
View of the rotating turntable and heating block.
Local atomic layer deposition: View of the rotating turntable below the heating block in the hybrid area.
© Fraunhofer IST
Local atomic layer deposition: View of the rotating turntable below the heating block in the hybrid area.

Further information

 

From research

Fields of application for atomic layer deposition