Fraunhofer Institute for Surface Engineering and Thin Films IST
HWCVD inline coating system at the Fraunhofer IST.
Hot-wire activated Chemical Vapor Deposition (Hot-wire CVD)
Technology and process development for the production of CVD diamond and silicon-based coating systems
Hot-wire CVD is a core competence of the Fraunhofer IST and permits in particular the production of crystalline diamond coatings on large surfaces and over complex geometries. Other possibilities include electronic and optical layers on a silicon basis. We develop and research processes and coating systems with application-specific requirement profiles, for example for tools, elements, optical components, photovoltaics, sensors and microsystems. We also offer support in the technology transfer of coating modules, components and systems.
Process and system expertise
We offer process and coating development for your application and develop complete solutions starting with the selection of suitable base materials, through pre-treatment, coating and process development, and on to analytics, qualification and quality assurance. We offer the transfer of hot-wire CVD technology for diamond and silicon-based coatings through R&D services, small-series feasibility demonstration and the construction of coating modules and systems.
Hot-wire CVD systems for diamond coating
CVDiamond XXL hotfilament chemical vapor deposition installation.
Fully automated HFCVD systems developed at the Fraunhofer IST allow coating on surfaces of up to 1000 x 500 mm². In addition, facilities and processes are available for the diamond-coating of complex components and tools and for internal diamond coating. Possible materials for coating include hard metals, ceramics (especially SiC, Si3N4), refractory metals, silicon and glasses.
Specifications / technical data
- Large-surface coating (500 x 1000 mm2) with polycrystalline diamond coatings
- Diamond-coating of components and tools and for internal diamond coating
Hot-wire CVD inline system
Charging of the hot-wire CVD inline system for the deposition of silicon and silicon nitride coatings. Maximum substrate dimensions: 500 mm x 600 mm.
Hot-wire CVD also offers decisive advantages in the production of silicon-based coatings compared to commonly used plasma-assisted coating processes:
- High gas yields
- High coating rates
- Simple system technology
- Easy to scale up to large coating areas
- High-energy particle bombardment offers gentle coating process without damage to substrate and growing layer
- High energy efficiency
- Low “Total Cost of Ownership“.
With our inline systems, areas of up to 600 x 500 mm² can be coated.