Special Equipment

The Fraunhofer IST has a well-equipped coating center for the manufacturing of prototypes and pilot series. Here we provide you with an overview of our equipment.

  •  a-C:H:Me, a-C:H, hard coating production plant (up to 3 m3 volume)
  • Coating facilities incorporating magnetron and RF diode sputtering
  • Sputter plant for high-precise optical coatings
  • In-line coating facility for large-surface optical functional coatings (up to 60 × 100 cm2)
  • Industrial scale HIPIMS technology
  • Plants for plasma diffusion
  • Coating systems for hollow cathode processes
  • Coating plant for thermal and plasma atomic layer deposition (ALD) (2D and 3D)
  • Hot-filament-CVD units for crystalline diamond coatings (up to 50 × 100 cm2) and for internal coatings
  • Hot-filament-CVD unit for silicon-based coatings (batch process and run-through process up to 50 x 60 cm2)
  • Plasma-activated CVD (PACVD) units, combined with plasma nitriding
  • Atmospheric pressure plasma systems for coating and functionalization of large areas (up to 40 cm widths)
  • Microplasma plants for selective functionalization of surfaces (up to Ø = 20 cm)
  • Bond aligner with an integrated plasma tool for wafer pretreatment in the clean room
  • Roll-to-roll set-up for area-selective functionalization of surfaces up to 10 m / min
  • Machine for internal coating of bags or bottles
  • Laser for 2D and 3D microstructuring
  • Automated system for deposition of polyelectrolyte
  • 2 mask aligner for photolithographic structuring
  • Laboratory for microstructuring (40 m2 clean room)
  • System for electroplating metallization of waveguides (11 active baths with a volume of each 140 l and 1 nicke bath with a volume of 400 l)
  • Modular technical electroplating system (20 stations for active baths with a volume of each 20 l)
  • Anodizing plant (11 active baths with a volume of each 140 l and 2 anodizing baths with a volume of each 350 l)
  • 15-stage cleaning unit for surface cleaning on aqueous basis
  • Clean room – large area coating (25 m2)
  • Clean room – sensor technology (35 m2)
  • Laser structuring laboratory (17 m2)
  • Mobile atmospheric pressure plasma sources
  • Nanosecond dye laser (Nd: YAG-Laser)
  • CO2-laser and Excimer-Laser
  • EUV spectrography
  • Semiconductor laser
  • Picosecond laser
  • Energy-dispersive X-ray spectroscopy (EDX)
  • SEM with focussed ion beam (FIB)
  • Electron microprobe (WDX, EPMA)
  • Secondary ion mass spectrometry (SIMS)
  • X-ray diffractometer (XRD, XRR)
  • X-ray photoelectron spectroscopy (XPS)
  • X-ray fluorescence analysis (RFA / XRF)
  • Glow discharge optical emission spectroscopy (GDOES)
  • Confocal laser microscope (CLM)
  • Scanning tunnel and atomic force microscope (STM, AFM)
  • FTIR microscope