Very high layer-thickness uniformity and precise thickness control are imperative for optical applications, as deviations from target values affect optical performance. Atomic layer deposition can be used to achieve high uniformity and reproducibility of layer deposition even on complex-geometric substrates.
Whereas conventional ALD systems require time-consuming rinsing routines, spatial atomic layer deposition enables a high coating rate whilst maintaining the coating-technology advantages. As a result of the integration possibility of further coating and activation technologies in a hybrid area, the advantages of other technologies (e.g. PVD, CVD) can be implemented in this system in order to develop innovative coating and material systems for groundbreaking solutions.
At the Fraunhofer IST we offer customers from industry and research application-specific and flexible solutions in the field of compliant batch and high-throughput coatings, ranging from process development through to the development of customized coating systems.
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