Exterior view of the new machine hall of the Fraunhofer IST.
© Fraunhofer IST, Falko Oldenburg
Exterior view of the new machine hall of the Fraunhofer IST.

Conference Program

  Thursday, December 5 Friday, December 6
8:00 Registration Registration
8:30 Welcome
8:40 Invited Talk
Fabrication of chromium carbide coatings by reactive sputtering – roles of power supply system and target poisoning
Jyh-Wei Lee
Ming Chi University of Technology, New Taipei, Taiwan
Invited talk
Coating development by reactive sputtering for energy related applications
Lucia Mendizabal
IK4Tekniker, Spain
9:20 The growth of multicomponent (CoCrFeMnNi) films by DC magnetron sputtering in Ar+dry air sputtering gas
György Radnóczi
Centre for Energy Research, Hungary
Deposition of micrometer-scale 3D pillar structures at room temperature without techniques such as glancing angle deposition, lithography, or shadow masking
Jarkko Etula
Aalto University, Finland
9:40 Influence of nitrogen content on structure and material properties for multi-component Al-Cr-Nb-Y-Zr-N thin films
Kristina von Fieandt
Uppsala University, Sweden
Multicomponent mobility at the interface between glass and oxides thin layers
Sirine Ben Khemis
Saint Gobain Recherche, France
10:00 Poster Session I and Coffee break Poster Session IV and Coffee break
10:40 Reactive ion beam sputter deposition of SiO2 and TiO2 thin films
Carsten Bundesmann
Leibniz Institute of Surface Engineering (IOM), Germany
Temporal evolution of sputtered species number densities in reactive HiPIMS with nitrogen admixture
Katarína Bernátová
Masaryk University, Czech Republic
11:00 Electronegativity of Mg-CF4 reactive sputter discharge
Eiji Kusano
Kanazawa Institute of Technology, Japan
How can we get a porous film by magnetron sputtering
Robin Dedoncker
Ghent University, Belgium
11:20 Analysis of hysteresis during the reactive magnetron sputtering process of piezoelectric zinc oxide thin films
Mhairi Rogan
NOVOSOUND LTD., United Kingdom
Spoke behaviour in reactive HiPIMS
Peter Klein
Masaryk University, Czech Republic
11:40 Diamond like carbon films with embedded copper nanoparticles deposited by reactive magnetron sputtering for saturable absorber mirror applications
Šarunas Meškinis
Kaunas University of Technology, Lithuania
On the description of metal ion return in reactive HiPIMS
Tomas Kubart
Uppsala University, Sweden
12:00 Lunch Lunch
13:20 Invited talk
Reactive magnetron sputtering, challenges in industrial and large area coating systems
Holger Pröhl
Invited talk
Atomistic simulations of reactive deposition processes
Marco Jupé
Laser Zentrum Hannover, Germany
14:00 Novel control technique for reactive HIPIMS processes to secure production stability over a target lifetime
Thomas Schütte
PLASUS GmbH, Germany
Distribution of O atoms on partially oxidized metal targets, and the consequences for sputtering of individual metal oxides
Jiri Houska
University of West Bohemia, Czech Republic
14:20 Challenges and solutions of reactive sputter deposition processes in the production environment: stability and control
Edmund Schüngel
Evatec AG, Switzerland
Unravel the nature of oxide sputter yields during reactive DC magnetron deposition
Koen Strijckmans
Ghent University, Belgium
14:40 12 µm in PVD with HiPIMS
Christoph Schiffers
CemeCon AG, Germany
Polycrystalline coatings: a fast method to model grain joints and thin-film interfaces
Jérôme Müller
Université de Namur, Belgium
15:00 Poster session II and Coffee break Simulation assisted deposition of optical filters onto 3D substrates by magnetron-sputtering
Andreas Pflug
Fraunhofer Institute for Surface Engineering and Thin Films IST, Germany
Closing Ceremony with Poster Prize  
15:40 Reactive sputter deposited CuWo4/WO3 nanostructured bilayers for hydrogen gas sensing
Nirmal Kumar
University of West Bohemia, Czech Republic
16:00 Photocatalytic bismuth oxide coatings and their potential for water treatment applications
Peter Kelly
Manchester Metropolitan University, United Kingdom
16:20 Low-temperature deposition of high-performance thermochromic VO2-based coatings for energy-saving windows
Tomáš Bárta
University of West Bohemia, Czech Republic
16:40 Reactive magnetron deposited SnZnOx coatings with low resistivity and high transparency
Martin Kormunda
J.E. Purkyne University, Czech Republic
17:00 Poster session III, Coffee break, and Company Tour
18:00 End of the first conference day
19:30 Conference Dinner
Altstadtmarkt 7, 38100 Braunschweig


Invited Speaker

Coating scientists, technologists, and managers will be invited to present papers at the conference:


Prof. Jyh-Wei Lee, Ming Chi University of Technology, New Taipei, Taiwan

”Fabrication of chromium carbide coatings by reactive sputtering- roles of power supply system and target poisoning” (Abstract)


Dr. Marco Jupé, Laser Zentrum Hannover, Germany

Atomistic simulations of reactive deposition processes (Abstract)


Dr. Lucia Mendizabal, IK4Tekniker, Spain

Coating development by reactive sputtering for energy related applications” (Abstract)


Dr. Holger Pröhl, VON ARDENNE GmbH, Germany

”Reactive magnetron sputtering, challenges in industrial and large area coating systems” (Abstract)



Poster Presentation

Influence of hydrogen on arc deposited chromium coatings
Johan Nyman
Linköping University, Sweden

Thermal stability of fracture-resistant W-B-C coatings
Saeed Mirzaei
Masaryk University, Czechia

On the structure and mechanical properties W-B-C coatings prepared by magnetron sputtering utilizing pulsed plasma excitation
Pavel Soucek
Masaryk University, Czech Republic

Amorphous zinc peroxide thin films deposited on actively cooled substrates by magnetron sputtering
Martins Zubkins
Institute of Solid State Physics, Latvia

DC magnetron sputtering: understanding the inherent limitations of 3D Pic-MC simulations and solutions to unravel them towards lab-scaled discharge current densities
Romain Tonneau
University of Namur, Belgium

Synthesis of nanoparticles by magnetron sputtering of silver onto castor oil
Anastasiya Sergievskaya
Umons, Belgium

Reactive sputter deposited Al/CuO thermite multilayers
Dulmaa Altangerel
Ghent University, Belgium

Deposition of TiO2 by means of HiPIMS: the dependence of optical properties on the energy deposited per atom

Pavel Moskovkin
University of Namur, Belgium

Continuous cleaning procedure of stainless steel by PVD sputtering in an inverted cylindrical magnetron
Carolina Esparza-Contro
Univ. Grenoble Alpes, France

Textured analysis of Ain films deposided on different substrates by DC reactive magnetron sputtering
RIAH Badis
University of Constantine 1, Algeria

Stabilizing reactive sputtering processes with moving substrates by plasma monitor feedback control

Tobias Radny
robeko GmbH & Co. KG, Germany

In-plane texturing of silver thin films
Francesca Corbella
Saint Gobain Research, France

Using remote plasma emission spectroscopy for control of various types of vacuum deposition processes

Florian Meyer
Gencoa Limited, UK

Boron sputtering with Ar and boron reactive sputtering with Ar and N2
Y.S. Song
Korea Institut of Industrial Technology, Republic of Korea

The effect of Cr content on the crystallographic and piezoelectric properties of CrxAl1-xN thin films

Saeedeh Soleimani
Hungarian Academy of Science-Institute of technical physics (MTA EK), Hungary

Joint experimental and theoretical study of the reactive magnetron PECVD of DLC films in an acetylene admixture
Antoine Fauroux
University of Namur, Belgium

Short Course

”Reactive Magnetron Sputter Deposition”


Reactive magnetron sputter deposition is a mature technique often used in laboratories and at industrial level to grow compound thin films. The growth of these films is defined by the deposition conditions, and therefore a good knowledge of the deposition process is essential to tune the growth and as such the film properties. After a short introduction on the physics of sputtering, the magnetron discharge and the transport of sputtered atoms through the gas phase, the course starts with a few definitions regarding reactive sputtering to show that the processes driving this technique are general applicable. This introduction assists the attendee to the next step: the description of the most common experiment during reactive magnetron sputtering, the hysteresis experiment. The simplicity of this experiment fools initially the scientist because it hides a complex interplay between different processes that define the actual outcome of the experiment. During the course, the details of this experiment are analyzed, and modelling is used to guide the attendee. In this way, the attendee will gain knowledge in a wealth of important process controlling the film growth. A good knowledge of these processes will arm the attendee to analyze and to control the reactive sputtering process.

Course Objectives

  • Understand the fundamental processes driving (reactive) magnetron sputtering
  • Develop strategies for dedicated experiments to unravel the complexity of reactive magnetron sputtering
  • To get a good overview of the current literature and modelling techniques
  • Sputtering: physics of sputtering, and transport of sputtered atoms
  • Magnetron discharges : typical features, electron emission, excitation and ionization
  • Hysteresis experiments : what can we learn from this “simple” experiment?
  • Influence of deposition parameters
  • Dynamics of reactive sputter deposition
  • Arcing
  • Discharge voltage behavior
  • Process parameters and thin film growth
  • Questions and answers


Diederik Depla, Professor, Ghent University, Ghent, Belgium