HIPIMS – a new sputtering technology
High-power impulse magnetron sputtering (HIPIMS) and high power pulse magnetron sputtering (HPPMS) generate plasmas with a high proportion of ionised layer forming atoms. The resulting film systems feature entirely new and improved characteristics, for instance regarding density, hardness, roughness or the refraction index, which cannot be realized with any other technology available today.
To use HIPIMS technology in production, existing PVD systems can be expanded cost-effectively by installing a corresponding pulse unit. The technology is being used and further developed at the Fraunhofer Institute for Surface Engineering and Thin Films IST, and is currently being brought to production readiness.