Insulating films

Thin electrical insulating films on an inorganic basis are produced at Fraunhofer IST. These are mostly metal oxides with layer thicknesses from a few hundred nm to several micrometers – depending on the required puncture strength. These films are especially temperature and wear-resistant, with a higher thermal conductivity than organic films, so they can be used efficiently for industrial applications.


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Insulation coatings with high dielectric breakdown strength