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© Fraunhofer IST
Data from a simulation performed at the Fraunhofer IST enables the optimization of shaper masks in order to solve problems during the production of optical components.
With the CALPHAD method (CALculation of PHAse Diagrams), which is based on the calculation of phase equilibrium states and thermodynamic properties in a defined system, material properties can be calculated.
At the Fraunhofer IST, a new method for accelerated the modelling of the film thickness profile on 3D substrates has been developed.
A particle simulation developed at the Fraunhofer IST enables the prediction of contamination of dust in plasma coating systems.
For the optimization of low-pressure coating processes, a parallelized simulation environment was developed.
© Fraunhofer IST, Rainer Meier, BFF Wittmar
At the Fraunhofer IST, a simulation model was developed to optimize the HWCVD process for Si deposition.