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© Fraunhofer IST, Falko Oldenburg
At the Fraunhofer IST film processes will be executed for homogeneous and uniform silicon oxide film of the sphere surface to reduce the degree of measurement uncertainty.
At the Fraunhofer IST outstanding possibilities for the deposition of highly demanding optical coatings were provided with the EOSS® (Enhanced Optical Sputtering System) coating platform.
© Fraunhofer IST
Via a particle simulation developed at the Fraunhofer IST it is now possible to predict the contamination of dust in plasma coating systems.
© Fraunhofer IST, Rainer Meier, BFF Wittmar
At the Fraunhofer IST, a hot-wire chemical vapor deposition method (HWCVD) has for the first time been evaluated as an alternative production method for SiO2 layers.
A new combined process for the production of so-called pixel filters has been developed at the Fraunhofer IST, consisting of coating and microstructuring.
© Fraunhofer IST, Chris Britze
The interference filters required by industry and technology can be manufactured with the aid of thin-film technologies.At the Fraunhofer IST a spectrometer with a smaller angle of divergence has been built.
© Fraunhofer IST, Jan Benz
With the development and construction of the innovative coating platform EOSS®, the Fraunhofer IST has created new possibilities for the deposition of highly demanding optical coatings.
The Fraunhofer IST develops optimized coating processes for optical interference coating systems on polymer films.
© Fraunhofer IST, Thomas Neubert
A chemical vapour deposition process has been developed at the Fraunhofer IST which allows the mechanical properties of coatings to be varied over a wide range.
The Fraunhofer IST has, as part of the EU project “NoScratch”, created antireflective coatings which show minimal abrasive wear even under the most extreme conditions.